-40%
Molecular Imprints Imprio 55 Nano Imprint Lithography System
$ 5280
- Description
- Size Guide
Description
Molecular Imprints Imprio 55 Nano Imprint Lithography System consisting of:- Model: Imprio 55
- Nano-imprint lithography tool
- Proven resolution down to 30 nm.
- The Imprio 55 utilizes S-FIL, a bi-layer lithography technique in which a low viscosity, UV-curable liquid is dispensed in droplets onto an underlying standard organic planarization layer, enabling imprinting on a wide range of semiconductor device layers.
- The Imprio 55 utilizes a step-and-repeat process has the flexibility to support up to 8 inch wafers with a low-cost single-size template.
- Fragile substrates like GaAs, InP, or glass can also be imprinted.
- The Imprio 55 can imprint up to a 10 mm square field or a 14 mm diameter round field.
This tool is available for inspection upon appointment at ClassOne's facility at 5302 Snapfinger Woods Dr, Decatur, GA 30035. Please see our website for any questions or interest.